X-ray luminescence of disperse SiO2 and porous silicon |
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Authors: | V. Y. Degoda V. M. Ogenko G. V. Vesna S. N. Naumenko |
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Affiliation: | (1) Institute of Surface Chemistry, National Academy of Sciences of Ukraine, 31, Nauka Ave., 252650 Kiev, Ukraine;(2) Taras Shevchenko Kiev University, 31, Nauka Ave., 252650 Kiev, Ukraine |
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Abstract: | We carry out a comparison between the luminescence spectra (photo-and x-ray luminescence) of porous silicon and disperse SiO2, which by its physical characteristics is most similar to oxide films on porous silicon. The photoluminescence of porous silicon was also investigated using fluorescence (excitation by a nitrogen laser) and metallographic microscopes. We found that the natures of the luminescence centers of porous silicon and disperse SiO2 are identical. A porous layer on single-crystal silicon ensures the creation of a highly branched surface of oxide film. Luminescence centers are located on its inner (as viewed from the porous silicon) surface. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 65, No. 2, pp. 247–251, March–April, 1998. |
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Keywords: | disperse SiO2 porous silicon photo-and x-ray luminescence luminescence centers |
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