Contact passivation in silicon solar cells using atomic‐layer‐deposited aluminum oxide layers |
| |
| Authors: | Dimitri Zielke Jan Hendrik Petermann Florian Werner Boris Veith Rolf Brendel Jan Schmidt |
| |
| Institution: | 1. Institute for Solar Energy Research Hamelin (ISFH), Am Ohrberg 1, 31860 Emmerthal, Germany;2. Institute of Solid State Physics, Leibniz University Hanover, Appelstra?e 2, 30167 Hanover, Germany |
| |
| Abstract: | Atomic‐layer‐deposited aluminum oxide (AlOx) layers are implemented between the phosphorous‐diffused n+‐emitter and the Al contact of passivated emitter and rear silicon solar cells. The increase in open‐circuit voltage Voc of 12 mV for solar cells with the Al/AlOx/n+‐Si tunnel contact compared to contacts without AlOx layer indicates contact passivation by the implemented AlOx. For the optimal AlOx layer thickness of 0.24 nm we achieve an independently confirmed energy conversion efficiency of 21.7% and a Voc of 673 mV. For AlOx thicknesses larger than 0.24 nm the tunnel probability decreases, resulting in a larger series resistance. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
| |
| Keywords: | contact passivation silicon solar cells aluminum oxide atomic layer deposition |
|
|
