液相放电法合成氮化碳晶体

自从 Cohen等 [1,2 ] 预言了一种碳氮化合物 ( β- C3N4 )可能具有比金刚石还高的硬度和其它优异的力学、电学和光学性能以来 ,人们竟相采用各种技术手段 (如化学气相沉积、磁控溅射、离子束沉积和激光刻蚀等 )尝试合成这种新材料 [3,4 ] .但是 ,大多数合成的氮化碳材料为非晶或者是少量的晶体包埋在非晶的碳和 CNx 材料中 ,尚未制得可以精确地研究其晶体结构的足够大的单晶 .1 999年 ,Fu等 [5] 将液相电沉积技术应用于氮化碳材料的合成 ,从乙腈中沉积了氮含量为 2 5 %的氮化碳薄膜 .目前电化学沉积法制备的氮化碳薄膜多为非晶膜 [6～ 9]…

Crystalline Carbon Nitride Deposited by Glow Discharge in Liquid Phase

A new electrodeposition system, with a thin nickel wire as the anode, was used to deposit the CN x thin film on Si(100) substrate from a dicyandiamide-saturated solution in acetonitrile at a high potential. During the experiment, when a certain high potential was applied, spark occurred between the Ni wire anode and the Si(100) substrate. The films were characterized by X-ray photoelectron spectroscopy(XPS), Fourier-transform infrared spectroscopy(FTIR), scaning electron microscopy(SEM) and X-ray diffraction(XRD). It was indicated that multiphase of α-C3N4, β-C3N4 and g-C3N4 was obtained in the films. This work is the first attempt to deposit carbon nitride material through a thin nickel wire anode and might provide a new route for preparing pure crystalline C3N4.