Microwave performance enhancement in Double and Single Gate HEMT with channel thickness variation |
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Authors: | Ritesh Gupta Servin Rathi Mridula GuptaRS Gupta |
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Institution: | Semiconductor Devices Research Laboratory, Department of Electronic Science, University of Delhi, South Campus, New Delhi 110021, India |
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Abstract: | In Single Gate HEMT (SGHEMT) shortening of gate length (Lg) below 100 nm leads to reduction in Transconductance (gm), which reduces the unloaded voltage gain (gm/gd) of the device, thereby reducing the maximum frequency of oscillation (fmax). The main reason for this reduction in gm with Lg in the Single Gate HEMT (SGHEMT) is its inability to maintain the desired channel aspect ratio (α). At such a miniaturization level, α not only depends on the channel depth (d) but also on the channel thickness (dc) of the device 5]. Moreover, the variation of dc may switch the device characteristics from quantum regime to classical regime and . The Double Gate HEMT (DGHEMT) and has emerged as a solution for further reduction in Lg and provides enhancements over SGHEMT by virtue of its double gate and also for same dc due to double heterojunctions, which virtually increases the value of α. In the present work, extensive simulation work has been carried out using ATLAS device simulator 35] in order to study the effect of dc and Lg on DGHEMT and SGHEMT. An analytical model has also been proposed for SGHEMT and DGHEMT to incorporate the effect of variation of dc and Lg. |
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Keywords: | DGHEMT SGHEMT Transconductance Output-conductance Cut-off frequency Maximum frequency of oscillation Unloaded voltage gain Channel thickness Short-channel effects Device aspect ratio |
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