| 高质量金刚石膜在无氧铜衬底上的MPCVD |
| |
| 引用本文： | 常开朋,程文娟,江锦春,张阳,朱鹤孙,沈德忠. 高质量金刚石膜在无氧铜衬底上的MPCVD[J]. 人工晶体学报, 2003, 32(4): 382-385 |
| |
| 作者姓名： | 常开朋 程文娟 江锦春 张阳 朱鹤孙 沈德忠 |
| |
| 作者单位： | 清华大学化学系,功能晶体与薄膜研究所,北京,100084;清华大学化学系,功能晶体与薄膜研究所,北京,100084;清华大学化学系,功能晶体与薄膜研究所,北京,100084;清华大学化学系,功能晶体与薄膜研究所,北京,100084;清华大学化学系,功能晶体与薄膜研究所,北京,100084;清华大学化学系,功能晶体与薄膜研究所,北京,100084 |
| |
| 摘 要： | 本文采用高纯无氧铜(Cu)片作为基片,用自行设计的微波等离子体化学气相沉积系统,制备出了高质量多晶金刚石膜.用场发射扫描电子显微镜(SEM)、Raman散射谱和X射线衍射谱(XRD)对制备的金刚石膜进行了表征与分析,其结果证明金刚石膜具有较优的质量.
|
| 关 键 词： | 金刚石薄膜 无氧铜 微波等离子体化学气相沉积 |
| 文章编号： | 1000-985X(2003)04-0382-04 |
| 修稿时间： | 2003-03-24 |
Growth of High Quality Diamond Films on Cu Metal Substrates by MPCVD |
| |
| CHANG Kai-peng,CHENG Wen-juan,JIANG Jin-chun,ZHANG Yang,ZHU He-sun,SHEN De-zhong. Growth of High Quality Diamond Films on Cu Metal Substrates by MPCVD[J]. Journal of Synthetic Crystals, 2003, 32(4): 382-385 |
| |
| Authors: | CHANG Kai-peng CHENG Wen-juan JIANG Jin-chun ZHANG Yang ZHU He-sun SHEN De-zhong |
| |
| Abstract: | High quality polycrystalline diamond films were deposited on Cu metal substrates by microwave plasma chemical vapor deposition (MPCVD) system. The samples obtained under different CH_4 concentration were characterized by high resolution scanning electron microscopy, Raman scattering spectroscopy and X-ray diffraction.The results show that the quality of diamond film prepared by the method is high. |
| |
| Keywords: | diamond films Cu substrate MPCVD |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
| 点击此处可从《人工晶体学报》浏览原始摘要信息 |
|
点击此处可从《人工晶体学报》下载全文 |
|
