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Defects and microvoids in a-Si and a-Si:H
Authors:Ai-Lien Jung  Yi-Hua Wang  Gang Liu  Jia-Jiong Xiong  Bi-Song Cao  Wei-Zhong Yu  David Adler
Affiliation:Department of Mathematics and Physics, Beijing Institute of Aeronautics and Astronautics, Beijing, People''s Republic of China;Department of Physics, Quinghua University, Beijing, People''s Republic of China;Center for Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
Abstract:
We report the first measurements of positron-annihilation spectra of samples of both pure and hydrogenated amorphous silicon. Comparison of these spectra with that of crystalline silicon indicates that the lowest-lifetime component can be identified as the contribution mainly from valence-band electrons. Both the pure (a-Si) and the hydrogenated (a-Si:H) samples exhibit a component with intermediate lifetime, which we attribute to small vacancies consisting of about 4 missing atoms. Finally, only a-Si:H shows a significant long-lived line (τ > 5 ns), which arises from large microvoids, with ~ 100 missing atoms. The existence of these microvoids in a-Si:H is consistent with recent reports of the presence of occluded H2 gas under high pressure in such films.
Keywords:
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