XPS研究等离子体处理的聚苯乙烯表面结构

采用不同功率、时间在不同气氛下对聚苯乙烯(PS)基片进行了等离子体处理。通过 X-射线光电子能谱技术、谱图的拟合、差谱分析和 Ar~+刻蚀的剖面处理,研究了 PS 表面组成与结构变化,指出处理的 PS 表面可能接入 C-O、C-NH、C=O、COOH 和 O-?-O 基团,因而改变了材料特性。

XPS STUDIES OF SURFACE STRUCTURE OF POLYSTYRENE EXPOSED TO PLASMA

The Polystyrene(PS)substrates were treated by plasma during different time(0.5,1,3,6,15,30 and 60 minutes)and the power(10, 20,60,100,150w)in the Ar,N_2,O_2,H_2,and air. The surface compositions,structure and states of the polystyrene were characterized by X—ray photoelectron spectroscopy(XPS),peak Synthesis of spectra,comparison of spectra,peak area measurement and depth profiling of Ar~+ sputtering. We have shown that large amounts of O and N atoms as new struc- ture were incorporaed into the polymer surface by the plasma treatment. We can obeseved that functional groups,such as C-O,C-NH_2,C=O, COOH and O-?-O were introduced to surface of Polystyrene under these conditions.The depth profiling can be accomplished by controlled erosion of the surface by Ar~+ sputtering.The shake-up stallite peak (291.7eV)ofπ-π~* transition for the polystyrene can again present after Ar~+ sputtering 6nm.The change of surface property of polysty- rene have been described.