Depth profiling in surface regions of oxidized metal alloys by low energy PIXE |
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Authors: | V Drüke R Hecker D Stöver |
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Institution: | (1) Institut für Reaktorentwicklung, Kernforschungsanlage Jülich GmbH, Postfach 1913, D-5170 Jülich, Federal Republic of Germany |
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Abstract: | As a nondestructive technique for depth profiling of elements the PIXE-method was applied to determine the concentration profile of elements in the near surface of oxidized metal alloys. The outer region of about 1 m was investigated using low energy protons for X-ray excitation. A set of X-ray yield measurements was carried out at proton energies of 150 to 300 keV. The unfolding of the X-ray yields was performed by calculation of proton energy loss, X-ray production cross section and X-ray attenuation. |
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Keywords: | depth profiling low energy PIXE metal oxides |
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