Modeling the fission track etching process in apatite: Segmentation or crystallography influence

In this study, two factors which can influence fission track etching in apatite are considered: track segmentation (induced by thermal annealing) and variable radial etching speed (due to the reagent diffusion during the etching process).

During the latent track annealing, two distinguishable steps can be identified by measuring track lengths or diameters. A length reduction is firstly observed, followed by a segmentation process which leads to the emergence of disrupted regions (gaps).

At present time, electron microscopy studies on fission tracks in apatite show profiles which lead to hypotheses of a variable radial etching speed versus depth. These variations can be interpreted in terms of acid diffusion along the track. Moreover, the existence of several bulk etching speeds related to crystallographic orientation is approached.

Taking into account these different points, a software program, integrating parameters as original track orientation and depth, number of gaps, etc., is developed in order to model the track profile evolution during the etching process. Comparison with experiments in Durango apatite (Mexico) are also undertaken.