首页 | 本学科首页   官方微博 | 高级检索  
     检索      

Atomic-Scale Study of Ge-Induced Incommensurate Phases on Si(111)
引用本文:吴蕊,王立莉,张翼,马旭村,贾金锋,薛其坤.Atomic-Scale Study of Ge-Induced Incommensurate Phases on Si(111)[J].中国物理快报,2010(2):228-231.
作者姓名:吴蕊  王立莉  张翼  马旭村  贾金锋  薛其坤
作者单位:[1]Institute of Physics, Chinese Academy of Sciences, Beijing 100190 [2]Department of Physics, Tsinghua University, Beijing 100084
基金项目:Supported by the National Natural Science Foundation of China under Grant Nos 20733008 and 10904168, and the National Basic Research Program of China under Grant No 2009CB929404.
摘    要:Two Ge-induced incommensurate phases, γ and β, on Si(111) are observed and studied by {/it in situ} scanning tunneling microscopy. The γ phase consists of aligned triangular domains whose stacking sequence is faulted with respect to the Si(111)-1×1 surface. The β phase consists of two kinds of triangular domains whose stacking sequences are faulted and unfaulted with respect to the Si(111)-1×1 surface, respectively. In the β phase, two types of domain walls, zigzag'' and face-to-face'', form to release the strain. The triangular domains all exhibit a quasi-1×1 hexagonal close-packed structure. By studying the structural evolution from magic clusters to incommensurate structures, the structure models for γ and β phases are proposed.

关 键 词:原子尺度  六角密堆积结构  Si(111)  扫描隧道显微镜  诱导  锗硅  表面断裂  amp
本文献已被 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号