Effect of Mn-doping on the electrical properties of Cu2GeSe3 |
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Authors: | G. Marcano |
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Affiliation: | Centro de Estudios de Semiconductores, Departamento de Física, Facultad de Ciencias, Universidad de Los Andes, Mérida 5101, Venezuela |
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Abstract: | In this work we report the temperature dependence of the resistivity ρ of p-Cu2GeSe3 and manganese-doped p-Cu2GeSe3 at low temperature. It was found that for a intrinsic sample ρ obeys the Shklovskii-Efros-type variable-range hopping resistivity law in the temperature range from 4 to 63 K. This behaviour is governed by generation of a Coulomb gap Δ=78 meV in the density of localized states. We find a low activation term T0=0.24 K, which is an indication of a large localization length ξ. For Mn-doped sample a metal-insulator transition (MIT) is observed at T=65 K. On the basis of the Mott criterion for metal-insulator transition, the critical carrier density nc is determined. From the analysis of resistivity data it is concluded that Mn acts as acceptor impurity. |
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Keywords: | A. Semiconductors C. X-ray diffraction D. Electrical properties D. Crystal structure |
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