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Optical characterization of InGaAsN/GaAsN/GaAs quantum wells with InGaP cladding layers
Authors:CR Lu  HL Liu  CH Wu  LW Sung
Institution:a Department of Physics, National Taiwan Normal University, Taipei 116, Taiwan, ROC
b Institute of Electrical Engineering, National Taiwan University, Taipei 116, Taiwan, ROC
Abstract:Optical properties of InGaAsN/GaAs and InGaAsN/GaAsN/GaAs quantum well structures with InGaP cladding layers were studied by photoreflectance at various temperatures. The excitonic interband transitions of the InGaAsN/GaAsN/GaAs QW systems were observed in the spectral range above =Eg(InGaAsN). The confinement potential of the system with strain compensating GaAsN barriers became one step broader, thus more quantum states and larger optical transition rate were observed. A matrix transfer algorithm was used to calculate the subband energies numerically. Band gap energies, effective masses were adopted from the band anti-crossing model with band-offset values adjusted to obtain the subband energies to best fit the observed optical transition features. A spectral feature below and near the GaAs band gap energy from GaAs barriers is enhanced by the GaAs/InGaP interface space charge accumulation induced internal field.
Keywords:A  Semiconductors  A  Quantum wells  D  Optical properties
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