溅射制备的Co/V多层膜微观结构特征与铁磁共振研究

研究了用射频磁控溅射方法制备的［Co(1.5nm)/V(d_V)］₂₀(0.5nm≤d_V≤4nm)多层膜的结构和磁性.用X射线衍射、透射电子显微镜、高分辨率透射电子显微镜等手段对其结构的分析，表明它们层状周期结构良好，沿膜的生长方向具有fcc Co(111)和bcc V(110)织构，且是由小的柱状晶粒构成的多晶薄膜.界面一定程度的合金化，使其成为成分调制周期结构，也是它们的一个结构特征.由其铁磁共振谱计算得到较小的g因子和4πM_{e 关键词：}

STUDY ON MICROSTRUCTURAL CHARACTERIZATION AND FERROMAGNETIC RESONANCE IN SPUTTERED Co/V MULTILAYERS

The structure and magnetic properties of a series of rf sputtered ［Co(1.5nm)/V(d_V)］₂₀(0.5nm≤d_V≤4nm)multilayers have been studied.The multilayers structure is found by X-ray diffraction,cross-section transmission electron microscopy,and high-resolution transmission electron microscopy to be polycrystalline with small individual columnar grains and has fairly strong fcc Co(111)and bcc V(110) texture in the film growth direction.The structural characterizations also show composition-modulated structure and severely alloyed effect.Ferromagnetic resonance measurements show relatively small g factors and 4π M_eff values,which also indicates that multilayers are severely alloyed.Complicated spin wave resonance spectra were observed and analyzed.The evaluated small interlayer coupling constant shows the effect of weak exchange coupling between Co layers across V spacers.