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Chemistry of chloroethylenes on Cu(100): bonding and reactions
Authors:Michael X. Yang   Phillip W. Kash   Dong-Hong Sun   George W. Flynn   Brian E. Bent   Michael T. Holbrook   Simon R. Bare   Daniel A. Fischer  John L. Gland
Affiliation:

a Department of Chemistry, Columbia University, New York. NY 10027, USA

b The Dow Chemical Company, Midland, MI 48674, USA

c National Institute of Standard and Technology, NSLS, Brookhaven National Laboratory, Upton, NY 11973, USA

d Department of Chemistry, University of Michigan, Ann Arbor, MI 48109, USA

Abstract:
The bonding and reactions of chloroethylenes (vinyl chloride, trans- and cis-dichloroethylene, trichloroethylene) on a Cu(100) surface have been investigated by temperature-programmed desorption and reaction, near-edge X-ray absorption fine structure (NEXAFS) studies and measurements of changes of the surface work function. The monolayer molecules adsorb molecularly intact at 95 K via π coordination. The molecules orient with their molecular planes parallel to the surface with little increase (<0.02 Å) in the C---C bond distance compared with the gas phase values. The degree of thermal dissociation increases with the extent of halogenation, and no chlorine is present in the hydrocarbon reaction products liberated from the surface. Both cis- and trans-1.2-chloroethylene produce acetylene and a small amount of benzene, while dissociation of trichloroethylene generates acetylene and deposits a carbon residue on the surface. Vinyl chloride desorbs from Cu(100) without reaction.
Keywords:Alkenes   Chemisorption   Copper   Halides   Near edge extended X-ray absorption fine structure, NEXAFS   Surface chemical reaction   Thermal desorption spectroscopy   Work function measurements
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