SiH+5 and the proton affinity of monosilane |
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Authors: | TMH Cheng FW Lampe |
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Institution: | Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, USA |
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Abstract: | Tandem mass spectrometric studies show that SiH+5 is formed in bimolecular reactions of SiH4 and NH+2, C2H+3, C2H+6 and C3H+8 ions. The dependence of the reaction cross sections on ion energy indicates the formation of SiH+5 from NH+2, C2H+3, and C2H+6 to be exothermic reactions, while formation from C3H+8 is endothermic. Using known thermochemical data, these facts permit the assignment of 150 and 156 kcal/mole to the lower and upper limits of the proton affinity of monosilane. |
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