| Theoretical analysis of ion kinetic energies and DLC film deposition by CH4＋ Ar （He） dielectric barrier discharge plasmas |
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| 引用本文： | 刘艳红,张家良,马腾才,李建,刘东平.Theoretical analysis of ion kinetic energies and DLC film deposition by CH4＋ Ar （He） dielectric barrier discharge plasmas[J].中国物理 B,2007,16(9):2809-2813. |
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| 作者姓名： | 刘艳红 张家良 马腾才 李建 刘东平 |
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| 作者单位： | State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China;State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China;State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China;State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China;Department of Mathematic and Physics, Dalian Nationality
University, Dalian 116600, China |
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| 基金项目： | Project supported by the National
Natural Science Foundation of China (Grant No 10405005). |
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| 摘 要： | The kinetic energy of ions in dielectric barrier discharge plasmas are analysed theoretically using the model of binary collisions between ions and gas molecules. Langevin equation for ions in other gases, Blanc law for ions in mixed gases, and the two-temperature model for ions at higher reduced field are used to determine the ion mobility. The kinetic energies of ions in CH4 ＋ Ar（He） dielectric barrier discharge plasma at a fixed total gas pressure and various Ar （He） concentrations are calculated. It is found that with increasing Ar （He） concentration in CH4 ＋ Ar （He） from 20% to 83%, the CH4＋ kinetic energy increases from 69.6 （43.9） to 92.1 （128.5）eV, while the Ar＋ （He＋） kinetic energy decreases from 97 （145.2） to 78.8 （75.5）eV. The increase of CH4＋ kinetic energy is responsible for the increase of hardness of diamond-like carbon films deposited by CH4 ＋ Ar （He） dielectric barrier discharge without bias voltage over substrates.
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| 关 键 词： | 离子能量 电子绝缘体 电子流量 金刚石 |
| 收稿时间： | 6/5/2006 12:00:00 AM |
| 修稿时间： | 3/9/2007 12:00:00 AM |
Theoretical analysis of ion kinetic energies and DLC film deposition by CH4+Ar (He) dielectric barrier discharge plasmas |
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| Liu Yan-Hong,Zhang Jia-Liang,Ma Teng-Cai,Li Jian and Liu Dong-Ping.Theoretical analysis of ion kinetic energies and DLC film deposition by CH4+Ar (He) dielectric barrier discharge plasmas[J].Chinese Physics B,2007,16(9):2809-2813. |
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| Authors: | Liu Yan-Hong Zhang Jia-Liang Ma Teng-Cai Li Jian and Liu Dong-Ping |
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| Institution: | 1. State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dedian University of Technology, Dedian 116024, China ;2.Department of Mathematic and Physics, Dalian Nationality University, Dalian 116600, China |
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| Abstract: | The kinetic energy of ions in dielectric barrier discharge plasmas
are analysed theoretically using the model of binary collisions
between ions and gas molecules. Langevin equation for ions in other
gases, Blanc law for ions in mixed gases, and the two-temperature
model for ions at higher reduced field are used to determine the ion
mobility. The kinetic energies of ions in CH$_{4}$\,+\,Ar(He)
dielectric barrier discharge plasma at a fixed total gas pressure and
various Ar (He) concentrations are calculated. It is found that with
increasing Ar (He) concentration in CH$_{4}$\,+\,Ar (He) from 20{\%}
to 83{\%}, the CH$_{4}^{ + }$ kinetic energy increases from 69.6
(43.9) to 92.1 (128.5)\,eV, while the Ar$^{ + }$ (He$^{ + })$ kinetic
energy decreases from 97 (145.2) to 78.8 (75.5)\,eV. The increase of
CH$_{4}^{ + }$ kinetic energy is responsible for the increase of
hardness of diamond-like carbon films deposited by CH$_{4}$\,+\,Ar
(He) dielectric barrier discharge without bias voltage over
substrates. |
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| Keywords: | ion energy dielectric barrier
discharge diamond-like carbon deposition |
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