RF electric field penetration and power deposition into nonequilibrium planar-type inductively coupled plasmas

The RF electric field penetration and the power deposition intoplanar-type inductively coupled plasmas in low-pressure dischargeshave been studied by means of a self-consistent model which consistsof Maxwell equations combined with the kinetic equation of electrons.The Maxwell equations are solved based on the expansion of theFourier--Bessel series for determining the RF electric field.Numerical results show the influence of a non-Maxwellian electronenergy distribution on the RF electric field penetration and thepower deposition for different coil currents. Moreover, thetwo-dimensional spatial profiles of RF electric field and powerdensity are also shown for different numbers of RF coil turns.