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He and H sequential implantation induced surface blistering and the exfoliation of Si covered with an oxide layer
Authors:WANG Zhuo  GAO Yu-Jie  LI Meng-Kai  ZHU Fei  ZHANG Da-Cheng  LIU Chang-Long
Institution:1,3 1 School of Science, Tianjin University, Tianjin 300072, China 2 School of Science, Tianjin University of Technology and Education, Tianjin 300222, China 3 Tianjin Key Laboratory of Low Dimension Materials Physics and Preparing Technology, Institute of Advanced Materials Physics Faculty of Science, Tianjin 300072, China
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