Thermal immobilization of ferrocene derivatives on (111) surface of n-type silicon: parallel between vinylferrocene and ferrocenecarboxaldehyde |
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Authors: | Tajimi Naomasa Sano Hikaru Murase Kuniaki Lee Kyung-Hwang Sugimura Hiroyuki |
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Institution: | Department of Materials Science and Engineering, Kyoto University, Yoshida-hommachi, Sakyo-ku, Kyoto 606-8501, Japan. |
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Abstract: | Monolayers attached to a Si(111) surface through Si-C-C or Si-O-C covalent bonds were prepared by the thermally activated reaction (150 degrees C) of vinylferrocene (VFC) or ferrocenecarboxaldehyde (FCA) molecules with hydrogen-terminated Si(111) substrate in order to compare their reactivities. The resulting monolayers gave a couple of redox waves on voltammograms due to ferrocenyl moieties tethered at the surface. The voltammetric quantification revealed that the growth of electrochemically active layers was terminated within 5 h and the final surface coverages of the active ferrocenyl moieties were 58% and 16% for VFC- and FCA-based monolayers, respectively, indicating that the aldehyde molecule is less reactive. X-ray photoelectron spectroscopy and ellipsometry, however, gave an indication that the growth of the VFC layer did not self-terminate and proceeded beyond a monolayer, while this overgrown part of the layer was not electrochemically active. |
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