On depth profiling from PIXE yields |
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| Authors: | P. Regnier I. Brissaud |
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| Affiliation: | (1) SRMP/D. Tech, CEN Saclay, 91191 Gif sur Yvette, France;(2) Institut de Physique Nucléaire, B.P. no 1, 91406 Orsay Cedex, France |
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| Abstract: | ![]()
The capabilities of a standard multiparametric fitting procedure for extracting concentration profiles from a set of PIXE yield measurements are evaluated for both: real Zn depletion profiles in an initially homogeneous Ag 3 at % Zn alloy, annealed under vacuum, and simulated sinusoidal profiles. The comparison with the profiles obtained via iteration plus smoothing shows that multiparametric fitting is more performing. |
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