A novel method for measuring the coma of a lithographic projection system by use of mirror-symmetry marks |
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| Authors: | Dongqing Zhang Xiangzhao Wang Weijie Shi Fan Wang |
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| Affiliation: | aInformation Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China;bGraduate School of the Chinese Academy of Sciences, Beijing 100039, China |
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| Abstract: | A novel method for measuring the coma of a lithographic projection system is proposed and the principle of the method is described. By utilizing mirror-symmetry marks, the adverse effects of axial aberrations on the coma measurement are avoided. Experimental results demonstrated that the method has high accuracy. Compared with TAMIS, the conventional technique used for coma measurement, the method is more reliable because the influences of the process factors on the lateral displacements have been considered. |
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| Keywords: | Coma Projection system Lithographic tool |
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