Fabrication of high quality two-dimensional photonic crystal mask layer patterns |
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Authors: | Yin-Sheng Peng Bo Xu Xiao-Ling Ye Jie-Bin Niu Rui Jia and Zhan-Guo Wang |
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Institution: | (1) CUDOS, School of Physics, University of Sydney, Sydney, NSW, 2006, Australia;(2) Department of Biomedical Engineering, Tufts University, Medford, MA 02155, USA;(3) MMTC, Department of Electrical and Computer Engineering, RMIT University, Melbourne, VIC, 3001, Australia |
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Abstract: | This work discusses the fabrication of two-dimensional photonic crystal mask layer patterns. Photonic crystal patterns having
holes with smooth and straight sidewalls are achieved by optimizing electron beam exposure doses during electron beam lithography
process. Thereafter, to precisely transfer the patterns from the beam resist to the SiO2 mask layer, we developed a pulse-time etching method and optimize various reaction ion etching conditions. Results show that
we can obtain high quality two-dimensional photonic crystal mask layer patterns. |
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