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X-ray photoelectron diffraction study of ultrathin PbTiO3 films |
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| Authors: | L. Despont C. Lichtensteiger F. Clerc M. G. Garnier F.J. Garcia de Abajo M. A. Van Hove J.-M. Triscone P. Aebi |
| Affiliation: | (1) Institut de Physique, Université de Neuchatel, Rue A.-L. Breguet 1, 2000 Neuchatel, Switzerland;(2) DPMC, Université de Genève, 24 Quai Ernest-Ansermet, 1211 Genève, Switzerland;(3) Centro Mixto CSIC-UPV/EHU, 20080 San Sebastián, Spain;(4) Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong |
| Abstract: | Full hemispherical X-ray photoelectron diffraction (XPD) experiments have been performed to investigate at the atomic level ultrathin epitaxial c-axis oriented PbTiO3 (PTO) films grown on Nb-doped SrTiO3 substrates. Comparison between experiment and theory allows us to identify a preferential ferroelectric polarization state in a 60 ? -thick PTO film. Multiple scattering theory based on a cluster-model [ Phys. Rev. B  , 075404 (2001)] is used to simulate the experiments. |
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