TOF-S-SIMS molecular depth profiling of organic bilayers using mechanical wear test methodology |
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Authors: | Roel De Mondt Luc Van Vaeck Andreas Heile Heinrich F Arlinghaus Frank Vangaever Jens Lenaerts |
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Institution: | 1.MiTAC, Department of Chemistry (CDE),University of Antwerp,Wilrijk,Belgium;2.Physikalisches Institut,Westf?lische Wilhelms-Universit?t Münster,Münster,Germany;3.Agfa Graphics N.V.,Mortsel,Belgium |
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Abstract: | Recent publications on static secondary ion mass spectrometry (S-SIMS) focus on molecular depth profiling by using polyatomic
or ultra-low energy monoatomic projectiles. Since their applicability depends on the relationship between the ion yield and
the depth, which is hard to obtain without extensive studies, a combination of a wear test method with S-SIMS surface analysis
was performed in the current study. Using this non-sputtering procedure, the relation between the signal intensity and the
local concentration remains in principle the same as that at the surface (which is easy to determine). Mechanical erosion
was successfully applied to expose sub-surface material from organic multilayers. Through surface analysis with S-SIMS on
the gradually exposed deeper planes, molecular depth profiles could be obtained. The study was conducted on a model system
relevant to offset printing, consisting of two polymer layers, containing dyes and a surfactant, cast on an Al substrate.
Figure Concept of mechanical erosion followed by S-SIMS surface analysis to obtain molecular depth profiles |
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Keywords: | Organic Static SIMS Depth profiling Molecular Polymer |
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