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TOF-S-SIMS molecular depth profiling of organic bilayers using mechanical wear test methodology
Authors:Roel De Mondt  Luc Van Vaeck  Andreas Heile  Heinrich F Arlinghaus  Frank Vangaever  Jens Lenaerts
Institution:1.MiTAC, Department of Chemistry (CDE),University of Antwerp,Wilrijk,Belgium;2.Physikalisches Institut,Westf?lische Wilhelms-Universit?t Münster,Münster,Germany;3.Agfa Graphics N.V.,Mortsel,Belgium
Abstract:Recent publications on static secondary ion mass spectrometry (S-SIMS) focus on molecular depth profiling by using polyatomic or ultra-low energy monoatomic projectiles. Since their applicability depends on the relationship between the ion yield and the depth, which is hard to obtain without extensive studies, a combination of a wear test method with S-SIMS surface analysis was performed in the current study. Using this non-sputtering procedure, the relation between the signal intensity and the local concentration remains in principle the same as that at the surface (which is easy to determine). Mechanical erosion was successfully applied to expose sub-surface material from organic multilayers. Through surface analysis with S-SIMS on the gradually exposed deeper planes, molecular depth profiles could be obtained. The study was conducted on a model system relevant to offset printing, consisting of two polymer layers, containing dyes and a surfactant, cast on an Al substrate. MediaObjects/216_2009_2657_Figa_HTML.gif Figure Concept of mechanical erosion followed by S-SIMS surface analysis to obtain molecular depth profiles
Keywords:Organic  Static SIMS  Depth profiling  Molecular  Polymer
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