| CeO2/Nb2O5界面效应对提高CeO2氧敏特性的XPS研究 |
| |
| 引用本文： | 杜新华,刘振祥,谢 侃,王燕斌,褚武扬.CeO2/Nb2O5界面效应对提高CeO2氧敏特性的XPS研究[J].物理学报,1998,47(12):2025-2030. |
| |
| 作者姓名： | 杜新华 刘振祥 谢 侃 王燕斌 褚武扬 |
| |
| 作者单位： | (1)北京科技大学材料物理系，北京 100083; (2)中国科学院物理研究所表面物理国家重点实验室，北京 100080 |
| |
| 基金项目： | 福特-中国发展研究基金(批准号：09415106)资助的课题. |
| |
| 摘 要： | 用射频/直流磁控溅射法制备了CeO2/Nb2O5双层氧敏薄膜，利用X射线光电子能谱(XPS)，描述并解释了单层CeO2薄膜中氧随温度变化的动力学行为，以及CeO2/Nb2O5薄膜界面对氧敏特性的影响.通过对Ce3d XPS谱的高斯拟合，计算了Ce3+浓度并给出了判定Ce4+还原的标志.结果表明，界面效应可以提高CeO2/Nb2O5薄膜中Ce4+的还原能力，使之远远高于单层CeO2薄膜，这对薄膜的氧敏特性是极为有利的.
关键词：
|
| 关 键 词： | 界面效应 氧敏特性 二氧化铯 薄膜 |
| 收稿时间： | 1998-04-22 |
| 修稿时间： | 6/3/1998 12:00:00 AM |
XPS STUDIES OF CeO2/Nb2O5 INTERFACE EFFECT ON THE IMPROVEMENT OF THE OXYGEN SENSITIVITY OF CeO2 LAYER |
| |
| DU XIN-HUA,LIU ZHEN-XIANG,XIE KAN,WANG YAN-BIN and CHU WU-YANG.XPS STUDIES OF CeO2/Nb2O5 INTERFACE EFFECT ON THE IMPROVEMENT OF THE OXYGEN SENSITIVITY OF CeO2 LAYER[J].Acta Physica Sinica,1998,47(12):2025-2030. |
| |
| Authors: | DU XIN-HUA LIU ZHEN-XIANG XIE KAN WANG YAN-BIN and CHU WU-YANG |
| |
| Abstract: | The CeO2 single layer and CeO2/Nb2O5 double-layer films have been deposited on a Al2O3 ceramic substrates by a reactive rf/dc sputtering magnetron system. The variation of kinetic behavior of oxygen in CeO2 single layer with temperatures, and also the influence of CeO2/Nb2O5 interface on oxygen sensitivity of the films have been studied by XPS. X-ray photoelectron spectra of Ce3d core level were deconvoluted by Gaussian function for calculating the different concentration of Ce3+ and Ce4+ in the films. The results have shown that the CeO2/Nb2O5 double-layer could improve reduction capability of Ce4+ easily due to the interface effect, so that the reduction capability is higher in CeO2/Nb2O5 double-layer than they were in CeO2 single layer. |
| |
| Keywords: | |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《物理学报》浏览原始摘要信息 |
| 点击此处可从《物理学报》下载免费的PDF全文 |
