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Mechanistic action of ferric oxide in the hydrosilylation of 1,6-divinyl(perfluorohexane) with trichlorosilane
Authors:Katsumi Katoh  Seiichiro Nagayama  Eiko Higashi  Katsuyuki Nakano
Affiliation:1. Faculty of Engineering, Fukuoka University, 8-19-1 Nanakuma, Jonan-ku, Fukuoka, 814-0180, Japan
2. Graduate School of Engineering, Fukuoka University, 8-19-1 Nanakuma, Jonan-ku, Fukuoka, 814-0180, Japan
Abstract:
In the hydrosilylation of 1,6-divinyl(perfluorohexane) (FDV) with trichlorosilane (TCS) in the presence of catalytic chloroplatinic acid (Pt-Cat) under an air atmosphere (0.99 MPa), a runaway reaction accompanied by a severe pressure release occurred when Fe2O3 was present as an impurity in the system. In this study, we investigated the mechanism of action of Fe2O3 on this hydrosilylation by monitoring the thermal behavior of TCS/FDV/Pt-Cat/Fe2O3 mixtures with various compositions, using an accelerating rate calorimeter (ARC). In the case of TSC/FDV/Pt-Cat, a typical hydrosilylation composition in the industrial process, heat release, possibly due to hydrosilylation, began at 90 °C. On the other hand, for TCS/FDV/Pt-Cat/Fe2O, the heat release due to hydrosilylation was hardly observed, but abrupt heat and pressure releases occurred at higher temperatures (>170 °C). Like TCS/FDV/Pt-Cat/Fe2O3, TCS/FDV, which contain neither Pt-Cat nor Fe2O3, released heat and pressure at high temperatures (>210 °C), while the heat and pressure release rates were comparatively low. From these results, the runaway reaction may occur when hydrosilylation is prevented, and Fe2O3 behaves as a negative catalyst for hydrosilylation. In the FT-IR spectrum of TCS/FDV/Pt-Cat/Fe2O3 after heating, an absorption peak at approximately 1,710 cm?1, which may be attributed to a carbonyl group, was observed. Thus, it is considered that the runaway reaction observed during the hydrosilylation results from the action of Fe2O3 as a negative catalyst for hydrosilylation as well as as an oxidation catalyst for the by-product generated from the reaction between TCS and FDV.
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