Close space vapor transport method for Bi2Te3 thin films deposition: Influence of the type of substrate |
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Authors: | O. Vigil-Galá n,F. Cruz-Gandarilla,E. Sá nchez-Meza,G. Contreras-Puente |
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Affiliation: | Escuela Superior de Física y Matemáticas—I.P.N., Edificio no. 9, U.P.A.L.M., 07738 México D.F., México |
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Abstract: | Bismuth telluride thin films have been grown by close space vapor transport (CSVT) technique as a function of substrate temperature (Tsub). Both N- and P-type samples can be obtained by this method which is a relatively simple procedure, which makes the method interesting for technological applications. The samples were deposited onto amorphous glass and polycrystalline CdTe film substrates in the substrate temperature range 300-425 °C, with a fixed gradient between source and substrate of 300 °C. The influence of the type of substrate and substrate temperature in the CSVT chamber on the physical properties of the films is presented and discussed. |
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Keywords: | A. Thin films D. Electrical properties |
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