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Electrochemistry of transition metal complexes of Schiff base compartmental ligands
Authors:Piero Zanello  Sergio Tamburini  Pietro Alessandro Vigato  Gian Antonio Mazzocchin
Affiliation:(1) Istituto di Chimica Generale dell'Università, Piano dei Mantellini 44, 53100 Siena, Italy;(2) Istituto di Chimica e Tecnologia dei Radioelementi, CNR, Corso Stati Uniti 4, 35100 Padova, Italy;(3) Istituto di Chimica Generale ed Inorganica dell'Università, Dorsoduro 2137, 30123 Venezia, Italy
Abstract:
Summary The electrochemical behaviour of a series of mononuclear and dinuclear complexes of dioxouranium(VI), nickel(II) and copper(II) ions with the Schiff base, H4fsalacen, derived from the condensation of 3-formylsalicylic acid and 1,2-diaminoethane, is reported.The potentially hexadentate compartmental ligand H4fsalacen has an outer O2O2 and an inner N2O2 coordination site. The redox properties of the metal ions in these two different and adjacent chambers have been investigated and compared with those of the analogous complexes with the ligand H4 aapen, obtained by reaction ofo-acetoacetylphenol and 1,2-diaminoethane.A preliminary report was presented at the 1st International Conference on the Chemistry and Technology of the Lanthanides and Actinides, Venice, 5 September, 1983, Italy.
Keywords:
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