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Polar dependence of impurity incorporation and yellow luminescence in GaN films grown by metal-organic chemical vapor deposition
Authors:S.R. Xu  Y. Hao  J.C. Zhang  Y.R. Cao  X.W. Zhou  L.A. Yang  X.X. Ou  K. Chen  W. Mao
Affiliation:1. Key Lab of Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi’an 710071, China;2. School of Electronical & Mechanical Engineering, Xidian University, Xi’an 710071, China
Abstract:
We have investigated the unintentional impurities, oxygen and carbon, in GaN films grown on c-plane, r-plane as well as m-plane sapphire by metal-organic chemical vapor deposition. The GaN layer was analyzed by secondary ion mass spectroscopy. The different trend of the incorporation of oxygen and carbon has been explained in the polar (0 0 0 1), nonpolar (1 1 2¯ 0) and semipolar (1 1 2¯ 2) GaN by a combination of the atom bonding structure and the origin direction of the impurities. Furthermore, it has been found that there is a stronger yellow luminescence (YL) in GaN with higher concentration of carbon, suggesting that C-involved defects are originally responsible for the YL.
Keywords:A1. Crystal morphology   A3. Metal-organic chemical vapor deposition   B1. Nitrides   B2. Semiconducting III&ndash  V materials
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