Alpha particle bias ionization in a pulsed nitrogen laser |
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| Authors: | C.E. Fellows C.C. Rodegheri U. Tauber K.H. Tsui M.P.P. de Castro C.E.M. Carvalho |
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| Affiliation: | (1) Laboratório de Espectroscopia e Laser, Instituto de Física, Universidade Federal Fluminense, Av. Gal. Milton Tavares de Souza, s/n Campus da Praia Vermelha, Boa Viagem, 24210-340 Niterói, RJ, Brazil;(2) Laboratório de Fotoquímica, Instituto de Química, Universidade Federal Fluminense, Campus do Valonguinho, Centro, 24020-150 Niterói, RJ, Brazil |
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| Abstract: | ![]()
This work reports the role of alpha particles generated by Americium (241Am) stripes placed inside the discharge channel in providing a bias ionized background plasma before, during, and after the discharge of the N2 TE UV laser (337.1 nm) circuit. The enhancement in stimulated radiation output characteristics in terms of gas pressure, charging voltage, and pulse width, with and without alpha particles, are shown. The increased laser yield is interpreted qualitatively through plasma impedance in the discharge circuit. PACS 42.60.By; 42.60.Lh |
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