Substitutional disorder effects on optical spectra of extremely heavily doped Si : P obtained by ion implantation and laser annealing |
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Authors: | T. Motooka T. Uda M. Miyao |
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Affiliation: | Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan |
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Abstract: | The optical reflectivity spectrum (2500–5000 Å) of extremely heavily phosphorus (P)-doped Si has been studied. The E1 and E2 peaks, which represent the completeness of the Si crystal, are slightly affected when doping concentrations are less than 1021 cm-3 (2% Si : P). However,they appreciably degrade as the doping concentration increases from 1021 to 5×1021cm-3 (10% Si : P). As the result of band calculations using a supercell configuration and pseudopotential method, we have been able to ascribe this behavior to the substitutional disorder effect. |
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