玻璃基片上SiO_2膜层厚度的测量方法

钠钙玻璃基片在液晶显示器件（ＬＣＤ） 等制造业中得到了广泛的应用。为防止基片中的碱金属离子扩散到器件的工作介质中，进而影响其化学稳定性和使用寿命，一般要在基片表面镀上一定厚度的ＳｉＯ２ 膜层，以便起到阻挡层的作用。基于Ｐ 蚀刻剂对ＳｉＯ２ 膜层和基片有显著不同的蚀刻速度，提出了一种测量玻璃基片上的ＳｉＯ２ 膜层厚度的方法，即：利用表面轮廓仪，在测量三个不同的蚀刻数据后，计算出ＳｉＯ２ 膜层的厚度。以用射频溅射法制备的ＳｉＯ２ 膜层为样品进行了测量，具体的实验数据证实了该方法的可靠性和有效性

Measuring the thickness of SiO2 film on glass substrate

Soda lime glass substrates are widely applied in liquid crystal devices (LCD) manufacturing in the recent two decades. In order to prevent the migration of alkali ions from glass substrates to the working media in the device which can affect both the chemical stability and the service life of the device, a silica dioxide (SiO 2) coating which acts as barrier layer with certain thickness is needed on the surface of the glass substrate. In this paper, based on the obvious difference of the etching rate between the SiO 2 film and the glass substrate in the P etch agent, a method to calculate the thickness of SiO 2 film is put forward through measuring the depths of three P etching steps. The experiment is done with the samples made by radio frequency (RF) sputter process. It has been proved that this method is effective and reliable.