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| 含氧膦结构的可溶性感光聚酰亚胺合成与表征 | |
| 引用本文： | 王维,张爱清,邱小林,杨志兰,乔学亮,陈建国.含氧膦结构的可溶性感光聚酰亚胺合成与表征[J].高分子学报,2006(3):545-548. |
| 作者姓名： | 王维 张爱清 邱小林 杨志兰 乔学亮 陈建国 |
| 作者单位： | 1. 模具技术国家重点实验室,华中科技大学材料科学与工程学院,武汉,430074 2. 催化材料科学湖北省重点实验室,中南民族大学化学与材料科学学院,武汉,430074 3. 南昌理工学院纳米材料研究中心,南昌,330013 |
| 基金项目： | 催化材料科学湖北省重点实验室基金 |
| 摘 要： | 聚酰亚胺(PI)是一类综合性能优异的功能性材料,广泛应用于航天、航空及电子工业等领域1].感光聚酰亚胺可以采用光刻工艺,大大简化了其应用加工程序2,3],因而备受人们所青睐.含查尔酮结构的聚合物对UV辐射敏感度高和化学稳定性好,最近被广泛的研究和应用4～7].主链含查尔酮结 |
| 关 键 词： | 聚酰亚胺 氧膦 查尔酮 合成 光敏性 |
| 收稿时间： | 2005-11-29 |
| 修稿时间： | 2006-01-20 |
SYNTHESIS AND CHARACTERIZATION OF SOLUBLE PHOTOSENSITIVE POLYIMIDES CONTAINING PHOSPHINE OXIDE MOIETIES |
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| WANG Wei,ZHANG Aiqing,QIU Xiaolin,YANG Zhilan,QIAO Xueliang,CHEN Jianguo.SYNTHESIS AND CHARACTERIZATION OF SOLUBLE PHOTOSENSITIVE POLYIMIDES CONTAINING PHOSPHINE OXIDE MOIETIES[J].Acta Polymerica Sinica,2006(3):545-548. | |
| Authors: | WANG Wei ZHANG Aiqing QIU Xiaolin YANG Zhilan QIAO Xueliang CHEN Jianguo |
| Abstract: | The soluble photosensitive polyimides were synthesized by the copolymerization of 3,3′-diaminochalcone (mDAC),bis(3-aminophenyl)-3,5-bis(trifluoromethyl)phenyl phosphine oxide (mDA6FPPO) and 4,4′-(hexafluoroisopropylidene)-diphthalic anhydride (6FDA).The polymers were characterized by FT-IR spectrum, and the properties of polymers were also discussed.The results show that the polyimides have excellent solubility in conventional organic solvents such as NMP,DMF,THF and acetone.The T_ gs of polyimides are ranged in 256℃～277℃.The polymers are stable up to over 400℃ and the residual weights at 800℃ are between 46%～50%.The resulting polyimides have good adhesive properties,and they were found to increase with increasing the mDA6FPPO content.The photosensitivity of the polymers was investigated by observations of UV-Vis spectral changes during UV irradiation. |
| Keywords: | Polyimide Phosphine oxide Chalcone Synthesis Photosensitivity |
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