Photo-curable organically modified silicate-phosphate alternating copolymer for photonics applications

Photo-curable vinyl modified silicate-phosphate alternating copolymers were prepared by a direct condensation of organochlorosilane and organophosphoric acid in a solvent-free condition. The obtained copolymers have complete alternating copolymer structure of silicate and phosphate unit, where the main oxo chain consist of –(Si–O–P–O) _n -network. They exhibited an excellent solubility of ionic species such as ionic organic dyes. It was also demonstrated the photo-reduction of Au⁺ ions to form Au nano particles for plasmonics applications. Micro patterns were also fabricated by soft lithographic processes. These results indicate that the photo-curable alternating copolymers are one of promising materials for advanced optical information processing devices.