Aerosol deposition of detonation nanodiamonds used as nucleation centers for the growth of nanocrystalline diamond films and isolated particles |
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Authors: | Feoktistov N A Sakharov V I Serenkov I T Tolmachev V A Korkin I V Aleksenskii A E Vul’ A Ya Golubev V G |
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Institution: | (1) Ioffe Physico-Technical Institute, Russian Academy of Sciences, St. Petersburg, 194021, Russia; |
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Abstract: | The aerosol deposition of detonation nanodiamonds (DNDs) on a silicon substrate is comprehensively studied, and the possibility
of subsequent growth of nanocrystalline diamond films and isolated particles on substrates coated with DNDs is demonstrated.
It is shown that a change in the deposition time and the weight concentration of DNDs in a suspension in the range 0.001–1%
results in a change in the shape of DND agglomerates and their number per unit substrate surface area N
s
from 108 to 1011 cm−2. Submicron isolated diamond particles are grown on a substrate coated with DND agglomerates at N
s
≈ 108 cm−2 using microwave plasma-enhanced chemical vapor deposition. At N
s
≈ 1010 cm−2, thin (∼100 nm) nanodiamond films with a root-mean-square surface roughness less than 15 nm are grown. |
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