| Abstract: | Heating (100) silicon at high temperature (say, higher than 850 °C) in H2, cooling to 670–700 °C in the same ambient, and quenching to room temperature in N2 results in environmentally robust, terraced 1 × 1 (100) SiH2. Evidence for this conclusion is based on angle‐resolved x‐ray photoelectron spectroscopy, atomic force microscopy, infrared absorption spectroscopy in the attenuated total reflection mode, thermal programmed desorption, and reflection high‐energy electron diffraction. Copyright © 2005 John Wiley & Sons, Ltd. |
