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Microstructural evolution of protective La–Cr–O films studied by transmission electron microscopy |
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| Authors: | Miaofang Chi Nigel Browning Nina Orlovskaya |
| Institution: | (1) Department of Chemical Engineering and Materials Science, University of California-Davis, Davis, CA 95616, USA;(2) Materials Science and Technology Division, Lawrence Livermore National Laboratory, Livermore, CA 94550, USA;(3) Department of Materials Science and Engineering, Michigan Technological University, 1400 Townsend Drive, Houghton, MI 49931, USA |
| Abstract: | Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS) were performed to study the microstructural evolution of La–Cr–O thin films deposited by radio frequency (RF)-magnetron sputtering on stainless steel substrates. Chromium L edges and oxygen K edges are analyzed to determine the valence states of the chromium and elucidate the phase evolution of the thin film. The as-deposited amorphous thin film crystallized to LaCrO4 and finally transformed to the LaCrO3 stable phase during annealing at 800°C. An intermediate Cr/Mn oxide layer was formed in all annealed samples. The thickness of this oxide layer stabilizes after 700°C, which indicates that the LaCrO3 thin film plays a role in inhibiting the growth of an oxide layer on the metal surface. |
| Keywords: | Interconnect material La– Cr– O thin films TEM EELS |
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