| Abstract: | ![]()
A series of novel photosensitive polybenzoxazole precursors were prepared from polycondensation of 2,2-bis(3,3′-amino-4,4′-hydroxyphenyl)hexafluoropropane with photosensitive dicarboxylic acid chlorides such as p-phenylenediacryloyl chloride and benzophenone-4,4′-dicarboxylic chloride. The precursors are soluble in common organic solvents owing to the presence of perfluoromethyl groups in the chain structure, and insolubilized in the solvents on irradiation with the light. Polybenzoxazole patterns with high resolution as well as high aspect ratio were reproduced by baking the precursor patterns at 300°C. The pattern shrinkage on the conversion to polybenzoxazole was slight. The polybenzoxazole films offered good heat-resistance up to 400°C in addition to good electrical properties. |
