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Photochemistry of cyclohexane on Cu(111)
Authors:Yamaguchi Dai  Matsumoto Taketoshi  Watanabe Kazuya  Takagi Noriaki  Matsumoto Yoshiyasu
Affiliation:The Graduate University for Advanced Studies (SOKENDAI), Department of Photoscience, Hayama, Kanagawa 240-0193, Japan.
Abstract:
The photochemistry of cyclohexane on Cu(111) and its excitation mechanism have been studied by temperature-programmed desorption, ultraviolet and X-ray photoelectron spectroscopy. Cyclohexane weakly adsorbed on Cu(111) has been known to show a broadened and redshifted CH stretching band, i.e., CH vibrational mode softening. Although no dehydrogenation takes place thermally on this surface and by the irradiation of photons at 5.0 eV, adsorbed cyclohexane is dissociated to cyclohexyl and hydrogen by the irradiation of photons at 6.4 eV. This is a marked contrast to cyclohexane in the gas phase where the onset of absorption is located at 7 eV. When the surface irradiated by 6.4-eV photons is further annealed, cyclohexyl is dehydrogenated to form cylcohexene that desorbs at 230 K. The systematic measurements of photochemical cross sections at 6.4 eV with linearly polarized light as a function of incident angle indicate that the electronic transition from the highest occupied band of cyclohexane to a partially occupied hybridized band near the Fermi level is responsible for the photochemistry. The hybridized band is formed by the interactions between the electronic states of cyclohexane and the metal substrate. The role of the hybridized band in the photochemistry and the CH vibrational mode softening is discussed.
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