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Robust and recoverable dual cross-linking networks in pressure-sensitive adhesives
Authors:Eun Seon Kim  Da Bin Song  Kyoung Hwan Choi  Jae Heung Lee  Dong Hack Suh  Woo Jin Choi
Institution:1. Chemical Materials Solutions Center, Korea Research Institute of Chemical Technology (KRICT), Daejeon, South Korea

Department of Chemical engineering, Hanyang University, Seoul, South Korea;2. Department of Chemical engineering, Hanyang University, Seoul, South Korea;3. Chemical Materials Solutions Center, Korea Research Institute of Chemical Technology (KRICT), Daejeon, South Korea

Abstract:Pressure-sensitive adhesives (PSAs) demand the ability to simultaneously improve toughness and adhesion. However, these requirements of PSAs have remained a great challenge because robust and recoverable characteristics are usually contradictory properties of PSAs. Dual cross-linking networks developed by incorporating dynamic noncovalent bonds into chemical cross-linking networks have the potential to mitigate these requirements in a wide variety of applications including adhesives, hydrogels, and elastomers. Herein, a facile approach to achieve dual cross-linking networks of acrylic PSAs with excellent mechanical properties and high-adhesive performance that integrate physically cross-linked networks into chemically cross-linked networks is proposed. Diurethane acrylic monomer-pentaerythritol ethoxylate (DAM-PEEL) groups were introduced into the acrylic PSA system through photopolymerization. The PSA/DAM-PEEL dual cross-linking networks led to the development of the chemically cross-linked networks for both PSA and DAM via covalent bonds and the physically cross-linked networks between the amide groups of DAM and the hydroxyl groups of PEEL via hydrogen bonds. Consequently, the PSA/DAM-PEEL dual cross-linking networks were able to simultaneously improve the modulus and stretchability. This design strategy for developing dual cross-linking networks of materials could offer potential applications for various adhesive-related applications.
Keywords:dual cross-linking networks  photopolymerization  pressure-sensitive adhesives  rheological properties  viscoelasticity
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