Modeling of the low-temperature production of gas-sensitive tin oxide films |
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| Authors: | V V Kisin S A Voroshilov V V Sysoev V V Simakov |
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| Institution: | (1) Saratov State Technical University, 410054 Saratov, Russia;(2) N. G. Chernyshevski Saratov State University, 410601 Saratov, Russia |
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| Abstract: | The deposition of tin oxide films by reactive sputtering of a stoichiometric target is investigated. Conditions are determined
for the formation of a crystal layer structure and the acquisition of gas sensitivity without subsequent high-temperature
annealing.
Zh. Tekh. Fiz. 69, 112–113 (April 1999) |
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