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Hybrid-DFT study for the initial oxidation steps on silicon cluster surface
Authors:Kenji Imamura  Kazuyuki Edamoto  Hiroaki Tokiwa
Affiliation:a Research Center for Measurement in Advanced Science (RCMAS), Rikkyo University, Nishi-Ikebukuro 3-34-1, Toshima-ku, Tokyo 171-8501, Japan
b Department of Chemistry, Faculty of Science, Rikkyo University, Nishi-Ikebukuro 3-34-1, Toshima-ku, Tokyo 171-8501, Japan
Abstract:We performed a hybrid density functional theory calculation for the successive adsorption of nitrous oxide (N2O) on Si(1 0 0)-Si9H12Ox (x = 0 and 1) cluster surfaces to elucidate N2O decomposition and the subsequent surface oxidation processes. N2O decomposed into N2 and O fragments, and the latter fragment inserted into either surface-dimer bonds or back-bonds with similar activation barriers on both the clean and partially oxidized Si surfaces. The Si9H12 cluster surface was eventually oxidized to five distinct structures of Si9H12O2.
Keywords:Silicon surfaces   Density functional theory calculation   Nitrous oxide   Oxidation
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