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Influence of ion species ratio on grid-enhanced plasma source ion implantation
Authors:Wang Jiu-Li  Zhang Gu-Ling  Liu Yuan-Fu  Wang You-Nian  Liu Chi-Zi and Yang Si-Ze
Institution:Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China; State Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams, Dalian University of Technology, Dalian 116023, China
Abstract:Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N_2^+ and atomic ions N^+ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N_2^+ was considered. Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N^+ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.
Keywords:plasma simulation  plasma sheath  two-ion fluid model  grid-enhanced plasma source ion implantation
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