| 金属-半导体比接触电阻的圆环结构测试法 |
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| 引用本文： | 朱德光,吴鼎芬.金属-半导体比接触电阻的圆环结构测试法[J].物理学报,1987,36(6):752-759. |
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| 作者姓名： | 朱德光 吴鼎芬 |
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| 作者单位： | 中国科学院上海冶金研究所 |
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| 摘 要： | 本文中提出了一种测量金属-半导体欧姆接触比接触电阻的新方法-圆环结构测试法。导出了适用于半无限大和有一定厚度的半导体材料的比接触电阻表达式,用此方法进行实验测量和计算,所得结果与文献结果符合得很好。
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| 收稿时间： | 8/4/1986 12:00:00 AM |
A METHOD TO DETERMINE THE SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR CONTACT——CIRCULAR RING STRUCTURE METHOD |
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| ZHU DE-GUANG and WU DING-FEN.A METHOD TO DETERMINE THE SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR CONTACT——CIRCULAR RING STRUCTURE METHOD[J].Acta Physica Sinica,1987,36(6):752-759. |
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| Authors: | ZHU DE-GUANG and WU DING-FEN |
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| Abstract: | In this paper, a method to determine the specific contact resistance of metal-semiconductor contact——circular ring structure method is presented. The equations for specific contact resistance which are used to both the definite thick and semiinfinite samples were derived. Some measurements and calculations have been carried out, the results are in good agreement with chose of methods published in the literature. |
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