Self-organization of triblock copolymer patterns obtained by drying and dewetting |
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Authors: | A J F Carvalho M A Pereira-da-Silva R M Faria |
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Institution: | 1. Instituto de F?sica de S?o Carlos, Universidade de S?o Paulo, C.P. 369, 13560-970, S?o Carlos, SP, Brazil 2. Campus Sorocaba, Universidade Federal de S?o Carlos, C.P. 3031, 18043-970, Sorocaba, SP, Brazil
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Abstract: | Self-organized block copolymer structures derived from dewetting of thin films are becoming important in nanotechnology because
of the various spontaneous and regular sub-micrometric surface patterns that may be obtained. Here, we report on the self-organization
of a poly(styrene)-b-poly(ethene-co-butene-1)-b-poly(styrene) triblock copolymer during drying of its solution over a mica
substrate. Regular submicrometric arrangements with long-range order were formed at critical polymer concentrations, consisting
of parallel ribbons and hexagonal arrays of dots (droplets). This variety of highly ordered structures is explained by the
interplay between forming mechanisms, mainly due to “fingering instabilities” at the three-phase line of the copolymer solution
during drying. The thickness of the structures was “quantized” due to the microphase separation of the block copolymer. The
formation of hexagonal patterns may be attributed to Marangoni instability at the liquid film surface prior to dewetting. |
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Keywords: | 68 15 +e Liquid thin films 68 55 -a Thin film structure and morphology 61 41 +e Polymers elastomers and plastics |
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