Anomalous multiphoton photoelectric effect in ultrashort time scales |
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Authors: | Kupersztych J Raynaud M |
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Institution: | DSM/DRECAM/SPCSI, CEA/Saclay, 91191 Gif-sur-Yvette, France. |
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Abstract: | In a multiphoton photoelectric process, an electron needs to absorb a given number of photons to escape the surface of a metal. It is shown for the first time that this number is not a constant depending only on the characteristics of the metal and light, but varies with the interaction duration in ultrashort time scales. The phenomenon occurs when electromagnetic energy is transferred, via ultrafast excitation of electron collective modes, to conduction electrons in a duration less than the electron energy damping time. It manifests itself through a dramatic increase of electron production. |
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