| 成像X射线光电子能谱定量分析研究 |
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| 引用本文： | 刘芬,邱丽美,赵良仲. 成像X射线光电子能谱定量分析研究[J]. 分析化学, 2003, 31(9): 1082-1084 |
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| 作者姓名： | 刘芬 邱丽美 赵良仲 |
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| 作者单位： | 中国科学院化学研究所,北京,100080;中国科学院化学研究所,北京,100080;中国科学院化学研究所,北京,100080 |
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| 摘 要： | 探索了直接用实验测得的XPS图像强度来做元素或化学态相对定量分析的可能性。以AgCl和Na2S2O3样品为例,实验结果表明：XPS图像强度与成像时间有良好的线性关系,根据图像强度对两种元素或化学态进行相对定量是可能的。
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| 关 键 词： | 成像X射线光电子能谱 定量分析 |
Research for Quantitative Imaging X-Ray Photoelectron Spectrometric Analysis |
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| Abstract: | We have explored the possibility of quantitative analysis based on the measurement of pixel intensity from the X-ray photoelectron spectrometric (XPS) image. The results for samples of AgCl and Na 2S 2O 3 have shown that there is a linear relationship between pixel intensity and the acquisition time, and it is possible to do elemental or chemical state quantitative analysis by using the measured pixel intensities. |
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| Keywords: | Imaging X-ray photoelectron spectrometry quantitative analysis |
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