Study on hydrogen sulfide 790-nm laser diode plasma passivation of cavity surface |
| |
Institution: | [1]State Key Laboratory of High Power Semiconductor Lasers,Changchun University of Science and Technology, Changchun 130022; [2]College of Information and Technology, Jilin Normal University, Siping 136000 |
| |
Abstract: | |
| |
Keywords: | |
本文献已被 维普 等数据库收录! |
|