Temperature dependence of the saturation magnetization of ion-implanted YIG films |
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Authors: | H. A. Algra P. Hansen |
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Affiliation: | (1) Philips Research Laboratories, NL-5600 JA Eindhoven, The Netherlands;(2) Philips Forschungslaboratorium Hamburg GmbH, D-2000 Hamburg 54, Fed. Rep. Germany |
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Abstract: | The temperature dependence of the saturation magnetization of a series of ionimplanted YIG films is presented. The films were implanted with neon ions at an energy of 450 keV; the dose ranged from 2 to 5*1014 ions/cm2. The experimental data can be described by the molecular field theory showing that the ion-implanted part of the film can be approximated as consisting of two regions each having their own magnetization and Curie temperature. The values of these magnetic parameters vary as a function of dose and differ strongly from the values for pure YIG. |
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Keywords: | 75.60-d 75.70-i |
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