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一种新型微透镜阵列成象式投影光刻系统的研究
引用本文:崔崧,高应俊,阮驰,郝爱花.一种新型微透镜阵列成象式投影光刻系统的研究[J].光子学报,2002,31(6):769-773.
作者姓名:崔崧  高应俊  阮驰  郝爱花
作者单位:中国科学院西安光学精密机械研究所,瞬态光学技术国家重点实验室,710068
基金项目:国家自然科学基金资助项目 ( 698770 2 3 )
摘    要:从理论和实验两方面入手,系统地研究了微透镜阵列的形成原理和制作工艺,分析了微透镜阵列的面形结构,得到了联系微透镜阵列矢高与制作工艺参量的经验公式.并且将四片微透镜阵列耦合,形成一个深紫外光刻的1:1成象的多孔径微小光刻系统.从几何光学理论出发,分析了这个光刻系统综合成象的特点,讨论了这种光刻系统的光学性能,并给出了实验测量方法.

关 键 词:微透镜阵列  光刻胶熔融法  离子束刻蚀法  光刻
收稿时间:2001/12/30
修稿时间:2001年12月30

A MICROLENS PROJECTION PHOTOLITHOGRAPHIC SYSTEM
Cui Song,Gao Yingjun,Ruan Chi,Hao Aihua State Key Lab of Transient Optics Technology,Xi'an Institute of Optics and Precision Mechanics Academia Sinica,Xi'an.A MICROLENS PROJECTION PHOTOLITHOGRAPHIC SYSTEM[J].Acta Photonica Sinica,2002,31(6):769-773.
Authors:Cui Song  Gao Yingjun  Ruan Chi  Hao Aihua State Key Lab of Transient Optics Technology  Xi'an Institute of Optics and Precision Mechanics Academia Sinica  Xi'an
Institution:Cui Song,Gao Yingjun,Ruan Chi,Hao Aihua State Key Lab of Transient Optics Technology,Xi'an Institute of Optics and Precision Mechanics Academia Sinica,Xi'an 710068
Abstract:Compared with conventional proximity printing,the microlens projection photolithographic system is a new novel technique.For a larger area of mask,especially for some non-planar substrates,the technique provides a better image and a larger working distance.A multiple-aperture photolithographic system that consists of four microlens arrays for 1:1 imaging was described,and the fabrication of this kind of microlens array is introduced.From the theory of applied optics,the characteristics of the photolithographic imaging system were analyzed.Experimental measurement results of the system were provided.
Keywords:Microlens arrays  Melting resist technique  Photolithography
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